| http://www.w3.org/ns/prov#value | - A method as claimed in claim 13, wherein said measuring differences in planarity includes: monitoring a location of an X-component of the force on the DUT and a location of an Y-component of the force on the DUT, said method including determining a limit for overdriving said simulated wafer as a function of said measured probe force on said DUT and said X-and Y-components thereof.
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