| http://www.w3.org/ns/prov#value | - For this reason, it is required to remove unnecessary products deposited on the inside of the reaction chamber without making use of a fluorine compound and a chlorine compound to clean the reaction chamber after taking out the substrate coated with a film composed mainly of carbon or its compound(s) from the chamber, so that the inside wall of the reaction chamber is not damaged by errosion.
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