| http://www.w3.org/ns/prov#value | - Insulator 3435 may be formed from any known insulator material in the CMOS industry, or packaging industry, for example such as SiO2, SiN, Al2O3, BeO, polyimide, PSG (phosphosilicate glass), photoresist, PVDF (polyvinylidene fluoride), sputtered glass, epoxy glass, and other dielectric materials and combinations of dielectric materials such as PVDF capped with an Al2O3 layer, for example.
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