| http://www.w3.org/ns/prov#value | - tand-alone metrology system, the difference in the position, orientation, and distortion of the two patterns. [0261] A stand-alone metrology system for measuring overlay comprises a microscope system for viewing the patterns, such as the scanning interferometric near-field confocal systems described above, connected to laser gauge-controlled stage for measuring the relative positions of the patter
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