| http://www.w3.org/ns/prov#value | - At this time, during the process for implanting the impurities into regions selected from the cell semiconductor region 20, the first to third peripheral semiconductor regions 21 a, 22 a and 22 b and the peripheral impurity region 21 b, regions other than the selected regions may be covered by an implantation mask such as a photoresist pattern mask, and this ion implantation mask may be removed af
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