About: http://webisa.webdatacommons.org/21044209

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Therefore, what is needed is a method and apparatus that maximize an exposure time of substrates in a lithographic apparatus and/or to minimize an increase in footprint of the lithographic apparatus when large substrates are exposed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com