About: http://webisa.webdatacommons.org/225597766

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Therefore, there is a need for a method and apparatus for preventing or reducing formation of contaminant residues and for removing contaminant residues formed during immersion lithography.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es