| http://www.w3.org/ns/prov#value | - In the meantime, where a plasma CVD method is used to form a CF film, since a C???C bond and a C???F bond which form the CF film have binding energy of similar levels, as film-forming gas is excited and dissociated in plasma to form a film, there is a tendency that F is liable to be dissociated from the formed film.
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