| http://www.w3.org/ns/prov#value | - rmed on semiconductor substrate from positive chemically amplified resist material including polyvinylphenol whose soubility in alkaline developer is changed via acid generator such as pentafluorobenzenesulfonateUS731201421 juin 200225 d???c. 2007Wako Pure Chemical Industries Ltd.Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium be
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