| http://www.w3.org/ns/prov#value | - The film formation mentioned above is performed by sputtering or deposition. [0252] In the present invention, the insulating layer 31 is preferably formed of an insulating material such as Al2O3 or SO2. [0253] The insulating layers 31 are each formed so that the upper surface thereof shown in FIG. 6 is located at approximately the same level as that of the upper surface of the laminate 30, and tha
|
