| http://www.w3.org/ns/prov#value | - c leather is used in the outermost polishing layer, and therefore there is no problem such as scratches, but there is the problem of poor planarizing characteristics in minute regions. (b) In the polishing pad described in JP-A 6-21028, the nonwoven fabric layer plays the same role as that of the elastic polyurethane layer described in U.S. Pat. No. 3,504,457, to achieve uniformity.
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