| http://www.w3.org/ns/prov#value | - In the present example, the patterned layer 10 is obtained by depositing a double-layer consisting of a first sub-layer 8 of, for example, polycrystalline silicon, and, on top thereof, a second sub-layer 9 composed of, for example silicon nitride, and patterning the double-layer e.g. in a usual photolithographic way.
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