About: http://webisa.webdatacommons.org/362256356

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention relates to a projection exposure apparatus used in the production of extremely fine patterns such as semiconductor integrated circuits.
http://www.w3.org/ns/prov#wasQuotedFrom	google.ca