About: http://webisa.webdatacommons.org/38444988

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention relates to an apparatus and a method for conducting a process such as etching, ashing and depositing on a semiconductor substrate or an LCD glass plate by plasma generated by using microwave energy.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com