| http://www.w3.org/ns/prov#value | - The second electrode layer 850 may be formed of a film mainly including an element selected from Ti, TiN, TiSiXNY, Ni, W, WSiX, WNX, WSiXNY, NbN, Cr, Pt, Zn, Sn, In, Ta, Al, Cu, Au, Ag, Mg, Ca, Li or Mo, or an alloy material or a compound material containing the element as its main component, or a stacked film thereof in a total thickness range of 100 to 800 nm.
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