About: http://webisa.webdatacommons.org/443478865

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	If needed, other thinning processes such as etching can be used to compliment the polishing to achieve the desired oxide thickness over the polysilicon gate electrode.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com