| http://www.w3.org/ns/prov#value | - According to an embodiment of the present disclosure, processes adopted in the manufacturing of the three-dimensional multi-bit non-volatile memory may comprise any one of chemical vapor deposition, sputtering, atom layer deposition, thermal evaporation, pulse laser deposition, electron beam evaporation and any other processes that can be used to achieve the structure, such as conventional lithogr
|