| http://www.w3.org/ns/prov#value | - The first interlayer insulating layer 601 can be made of an organic material having prominent planarization property and photosensitivity, an insulating material having low dielectric constant such as a-Si:C:O and a-Si:O:F, which are formed by plasma enhanced chemical vapor deposition (PECVD), or an inorganic material such as SiNx, etc.
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