About: vapor deposition

Premodifier: vapor
Head noun: deposition

Same concepts
http://dbpedia.org/resource/Vacuum_deposition

Broader concepts

label	provenance	confidence
technique	isap:191924692	0.861991
process	isap:219679917	0.859035
deposition process	isap:219679947	0.833896
physical vapor deposition method	isap:254346736	0.823808
thin film deposition method	isap:254346705	0.820500
suitable process	isap:219679934	0.800212
know technique	isap:191924710	0.798718
suitable technique	isap:191924712	0.798160
vapor phase growth process	isap:219680020	0.791943
deposition method	isap:254346685	0.789986
deposition technique	isap:191924720	0.785388
chemical deposition	isap:400695932	0.772265
means	isap:474931096	0.771461
method	isap:254346660	0.769954
conventional technique	isap:191924744	0.737908
suitable application method	isap:254346777	0.730098
various method	isap:254346669	0.718619
appropriate technique	isap:191924704	0.718562
metallization process	isap:219679943	0.718538
conventional means	isap:474931119	0.711234
known method	isap:254346665	0.705353
appropriate method	isap:254346719	0.704908
suitable method	isap:254346680	0.700598
known technique	isap:191924715	0.699130
suitable means	isap:474931098	0.694927
known process	isap:219679938	0.676835
layer	isap:472898703	0.644204
number of technique	isap:256390765	0.642959
variety of method	isap:218678106	0.634157
convenient means	isap:474931108	0.627909
known manner	isap:255294233	0.601162
semiconductor	isap:502759450	0.600135
deposition	isap:400695928	0.595252
useful means	isap:474931102	0.582604
metal film	isap:505948380	0.575347
fabrication technique	isap:191924812	0.554213
material	isap:282722733	0.511385
coating	isap:220102838	0.485590
art	isap:401120281	0.469926
thin layer	isap:472898719	0.424062
substrate	isap:192723806	0.415308
type	isap:505499957	0.371151
metal	isap:474861676	0.368552
se	isap:278729171	0.310782

Narrower concepts

label	provenance	confidence
chemical vapor deposition	isap:400695948	0.811381
chemical vapor	isap:259466310	0.744719
chemical vapor deposition cvd	isap:237540667	0.744309
silicon dioxide	isap:244105821	0.567085
mbe	isap:237998327	0.365337
sputtering	isap:399637512	0.274660
aluminum	isap:181124908	0.273934
cvd	isap:237540674	0.223552