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An Entity of Type : prov:Entity, within Data Space : wifo5-40.informatik.uni-mannheim.de:8890 associated with source dataset(s)

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  • A method has hitherto been known in which aluminum diffusion source layers in the form of a predetermined pattern are formed on the major surface of a silicon semiconductor substrate by means of deposition or the like, and the silicon semiconductor substrate is then heated in an atmosphere including an oxygen gas to form silicon-aluminum alloy layers from which aluminum diffuses into the silicon s
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