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An Entity of Type : prov:Entity, within Data Space : wifo5-40.informatik.uni-mannheim.de:8890 associated with source dataset(s)

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  • In this embodiment, at least one or more of the layers, including the plug, barrier, bottom electrode, dielectric, and/or top electrode is deposited by the inventive method comprising a precursor source mixture, vaporization of the precursor source mixture and deposition of a film using the vapor of the precursor source mixture in a CVD or ALD reactor.
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