| http://www.w3.org/ns/prov#value | - Next, as shown in FIG. 7 d, a non-magnetic layer 41 is formed of an insulating material such as Al2O3, SiO2, AlN or DLC or of a metal material such as Ti, Ta or Pt with thickness of approximately 0.1 ??m to 0.5 ??m, by means of, for example, a sputtering technique or a chemical vapor deposition (CVD) technique, for the purpose of magnetically separating the MR effect element 33 from an electromagn
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