| http://www.w3.org/ns/prov#value | - for irradiating the reticle R with the exposure light with a predetermined wavelength so as to transfer a predetermined pattern such as that of an electric circuit on the reticle R onto the substrate W. Here, the photosensitive substrate W comprises, for example, a substrate 7 such as silicon wafer or glass whose surface is coated with a photosensitive material 8 such as photoresist.
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