{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/12386081"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.de" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/256259391"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/12386081" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/256801028"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/12386081" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/137819980"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/12386081" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/137300572"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/12386081"] } } }
