{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/232303100"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Ions or the like are implanted into the transferred resist pattern, gradually forming wiring patterns or elements. [0006] Because photolithography, resist application, exposure, development, and other steps are needed in order to be able to use the aforementioned lithographic techniques, fine patterns can only be produced at well-equipped semiconductor plants or the like." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com.au" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/354819400"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/232303100" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/354516463"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/232303100"] } } }
