{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/266376204"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "In the above laminated line material, the fraction of N (value of x) of the TaNx, which is the first metal forming the lower layer. and the doping amount in case of doping N into the Ta film, which is the second metal layer forming the upper layer, may not be limited to the above values, because these values are dependent on such requirements as a sputtering system and a sputtering condition for f" ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/450952252"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/266376204"] } } }
