{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/268336877"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "After the MR effect multilayer 332??? is formed as described above, an insulating layer 335 of a material such as Al2O3 or SiO2 with a thickness of approximately 3-20 nm and a bias layer 336 of a material such as CoFe, NiFe, CoPt, or CoCrPt are formed, in sequence, by using a method such as sputtering as shown in FIG. 8 d." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/293719676"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/268336877"] } } }
