{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/270145999"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "In order to precisely work and observe a sample, such as the photomask, or a substrate patterned by the photomask, it is necessary to precisely position the sample inside the focused ion beam apparatus, and it is necessary to resolve the problems associated with an expansion and a contraction due to a temperature change inside or outside of the apparatus." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "freepatentsonline.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/132353001"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/270145999"] } } }
