{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/305722738"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "The method of claim 46, said step of providing said etch mask includes depositing on said second portion of the stack and said first material a mask layer covering said second portion of the stack and said first material, providing on said mask layer a photoresist mask that covers a portion of said mask layer, and etching away a remainder of said mask layer other than said portion of said mask lay" ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/40110265"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/305722738"] } } }
