{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/352980024"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "In a conventional manufacturing process of a TFT utilizing photolithography, a number of steps such as light exposure, development, baking, and peeling are required because of a mask pattern called photoresist formed of a photosensitive organic resin material." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/138614072"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/352980024" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/144224475"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/352980024"] } } }
