<http://webisa.webdatacommons.org/151009626>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/151009626>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.es> .
<http://webisa.webdatacommons.org/prov/235951241>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/151009626> .
<http://webisa.webdatacommons.org/prov/222274313>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/151009626> .
<http://webisa.webdatacommons.org/151009626>	<http://www.w3.org/ns/prov#value>	"A thin film of Ta2O5 may be deposited using reactive sputtering, chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), or electron cyclotron resonance (ECR) processing and any other suitable process." .