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<http://webisa.webdatacommons.org/231769933>	<http://www.w3.org/ns/prov#value>	"A metal silicide including a metal that is different from the metal catalyst is present within a region of the semiconductor layer under the contact hole from the surface of the semiconductor layer to a predetermined depth.02-26-2009" .
<http://webisa.webdatacommons.org/prov/294155232>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/231769933> .
<http://webisa.webdatacommons.org/231769933>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<faqs.org> .