<http://webisa.webdatacommons.org/291243482>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com.au> .
<http://webisa.webdatacommons.org/291243482>	<http://www.w3.org/ns/prov#value>	"In FIGS. 2A and 2B, an insulating film consisting mainly of silicon is formed on a Corning Corp. #1737 glass substrate, and silicon 201 crystallized by means of heat or a laser is formed on that to a thickness of 55 nm as an island-shaped semiconductor layer." .
<http://webisa.webdatacommons.org/prov/73720172>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/291243482> .
<http://webisa.webdatacommons.org/291243482>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .