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<http://webisa.webdatacommons.org/377293115>	<http://www.w3.org/ns/prov#value>	"A processing solution supply part 513 is arranged under the rotary base member 510 for supplying a processing solution such as an etching solution, a developer or a detergent to the lower surface of a substrate W in response to the contents of processing." .
<http://webisa.webdatacommons.org/377293115>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/prov/412517221>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/377293115> .