<http://webisa.webdatacommons.org/106925583>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/106925583>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/421373531>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/106925583> .
<http://webisa.webdatacommons.org/106925583>	<http://www.w3.org/ns/prov#value>	"ods for mechanical and/or chemical-mechanical polishing of microfeature workpiecesUS7147543Jul 28, 2005Dec 12, 2006Micron Technology, Inc.Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpiecesUS7163439Feb 8, 2006Jan 16, 2007Micron Technology, Inc.Methods and systems for conditioning planarizing pads used in planarizing substrat" .
<http://webisa.webdatacommons.org/prov/448318246>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/106925583> .