<http://webisa.webdatacommons.org/406909231>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.es> .
<http://webisa.webdatacommons.org/406909231>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/406909231>	<http://www.w3.org/ns/prov#value>	"The heat treatment according to the present invention is not limited to a baking treatment by which the substrate G coated with a solution such as a resist solution is heated, and may be a heat treatment of a chemical amplification resist carried out after exposure and before developing, for example." .
<http://webisa.webdatacommons.org/prov/60502501>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/406909231> .