About: silicon oxide

Premodifier: silicon
Head noun: oxide

Same concepts
http://dbpedia.org/resource/Silicon_oxide

Broader concepts

label	provenance	confidence
inorganic substance	isap:335846226	0.875732
dielectric material	isap:297664221	0.838879
silicon oxide	isap:367806887	0.836800
low dielectric constant material	isap:297664646	0.813432
inorganic oxide	isap:367806885	0.793981
metal oxide	isap:367806844	0.767568
suitable dielectric material	isap:297664297	0.751248
other material	isap:297664265	0.733712
second layer	isap:371623474	0.725080
insulation film	isap:201148867	0.722354
similar dielectric material	isap:297664612	0.721575
suitable material	isap:297664240	0.721413
material	isap:297664213	0.717116
film contain silicon	isap:201148860	0.717036
similar material	isap:297664355	0.716538
low k material	isap:297664511	0.714647
metal oxide layer	isap:371623408	0.700490
inorganic layer	isap:371623274	0.700361
insulative material	isap:297664289	0.699786
silicon compound	isap:296711962	0.695974
inorganic material	isap:297664225	0.694238
substance	isap:335846221	0.692849
stack structure	isap:338073043	0.692343
gate insulator	isap:338992788	0.682974
second dielectric layer	isap:371623459	0.672605
silicon nitride film	isap:201148907	0.666903
particle	isap:293126086	0.665152
oxide	isap:367806826	0.644733
dielectric layer	isap:371623251	0.643340
oxide material	isap:297664258	0.638631
barrier property	isap:298796192	0.637468
mixed oxide	isap:367807018	0.631065
oxide layer	isap:371623297	0.624217
surface of the substrate	isap:231134241	0.618996
insulative layer	isap:371623351	0.616196
type of dielectric material	isap:198721108	0.614616
inorganic compound	isap:296711906	0.603245
silicon nitride	isap:226908797	0.601936
non-conductive material	isap:297664599	0.599497
layer	isap:371623249	0.598771
insulation material	isap:297664298	0.595995
surface	isap:231134230	0.595846
mask layer	isap:371623371	0.594153
limited to	isap:239814932	0.593949
insulator layer	isap:371623265	0.591484
ceramic	isap:226405827	0.587283
first layer	isap:371623332	0.585204
isolation material	isap:297664537	0.580321
insulator	isap:338992779	0.579982
layer of insulate material	isap:371623270	0.577682
example	isap:228197337	0.572304
component	isap:334575365	0.569085
dielectric layer 12	isap:371623445	0.557855
compound	isap:296711929	0.550614
metal	isap:374626960	0.542437
aluminum oxide	isap:367806912	0.538349
embodiment	isap:261410185	0.536330
silicon dioxide	isap:227808735	0.531723
cvd method	isap:162911020	0.530698
alternatively	isap:96800355	0.527270
layer 6	isap:371623411	0.523364
multi-layer structure	isap:338073046	0.521085
insulation layer	isap:371623279	0.518276
semiconductor device	isap:154978561	0.517558
passivation layer	isap:371623271	0.512645
thin layer	isap:371623275	0.511476
fig 2b	isap:239809460	0.509356
sidewall	isap:296046298	0.505673
rigid material	isap:297664563	0.502590
gate dielectric layer	isap:201193819	0.494752
film	isap:201148854	0.479046
problem	isap:229120972	0.473581
silicon	isap:222337107	0.460724
stainless sus substrate	isap:337145306	0.458551
thin film	isap:201148875	0.447148
al	isap:239813736	0.436593
layer of silicon oxide	isap:371623326	0.436394
film 16	isap:201148926	0.434981
layer 22	isap:371623369	0.428441
moreover	isap:293422600	0.428129
further	isap:222852290	0.418107
gate insulate film 5	isap:201193820	0.416627
polymer	isap:223079090	0.412588
protective layer	isap:371623365	0.397045
materials	isap:339774078	0.393300
element	isap:225916850	0.392561
dielectric	isap:260048369	0.378662
semiconductor	isap:96654482	0.362096
glass	isap:371291200	0.338871
however	isap:231515576	0.335946
composition	isap:209138084	0.327500
also	isap:201463877	0.321796
layer 19	isap:371623457	0.319425
substrate	isap:337145294	0.281468
residue	isap:222132060	0.281241
purpose	isap:231559681	0.271192
mixture	isap:229323806	0.256087
quartz	isap:157446885	0.250545
gate insulate film 55	isap:201193821	0.222392

Narrower concepts

label	provenance	confidence
silicon oxide	isap:367806887	0.836800
aluminum oxide	isap:367806855	0.782765
silicon dioxide	isap:33195499	0.775203
silicon oxynitride	isap:476355105	0.682943
silicon dioxide sio2	isap:94993571	0.625493
oxide film	isap:92722706	0.621128
silicon nitride	isap:36297129	0.463528
glass	isap:372099904	0.396413
silicate glass	isap:372099915	0.396222
silicon	isap:33646822	0.387500
carbon	isap:121275831	0.373347
oxide	isap:367806965	0.368795
dielectric material	isap:362110271	0.366648
alumina	isap:31657979	0.360080
mgf2	isap:86650281	0.340598
sio2	isap:94993559	0.295988
sio	isap:468683383	0.295407
layer 50	isap:368858182	0.283403
gold	isap:85218018	0.261589
copper	isap:116981115	0.254195
surface	isap:39750013	0.246191
embodiment	isap:475029794	0.244408
sog	isap:468070651	0.185482
polypropylene	isap:141729188	0.176381
nm	isap:463777982	0.126073
material	isap:362110246	0.112820
film	isap:92722701	0.108902