Description
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owl:sameAs
Inference Rule:
b3s
b3sifp
facets
http://www.w3.org/2002/07/owl#
ldp
oplweb
skos-trans
virtrdf-label
None
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isa:103689154
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An Entity of Type :
prov:Entity
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webisa.webdatacommons.org
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Type:
prov:Entity
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rdf:type
prov:Entity
prov:value
In known processes, the Ta adhesion layer is required because metals deposited using conventional vapor deposition processes do not readily nucleate on the TaN barrier layer, leading to problems such as film delamination or agglomeration.
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google.com
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isap:477696958
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