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  • ology, Inc.Deposition methods for forming silicon oxide layersUS7531679Nov 14, 2002May 12, 2009Advanced Technology Materials, Inc.Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideUS7678708Jan 13, 2009Mar 16, 2010Micron Technology, Inc.Systems and methods for forming metal oxide layers
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