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  • For example, in accordance with Japanese Patent Laid-Open Nos. 7-130652 and 8-78329, a metal element such as nickel is introduced into an amorphous silicon film and a crystalline silicon film is obtained by a 4-hour heat treatment of 550??? C. [0012] The crystalline semiconductor film fabricated by any of the above-described related art methods has the property that since crystallization is influe
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