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  • For the purpose of removing the contaminants, impurities such as H2 O, CO2 or native oxide on the surface of the substrate 23, a mixed gas atmosphere of Ar+H2 is created in the deposition chamber 10, the dummy target 37 made of Si, SiO2 or the like is attached to the first electrode 20 as described above, the substrate 23 is attached to the second electrode 22, RF power at frequency of 200 MHz is
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