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  • For the interlayer insulating film, organic insulating materials such as polyimide may also be used in addition to what was mentioned in the above.Moreover, for the formation of polycrystalline silicon such a method is also available in which amorphous silicon is formed by LPCVD at low temperature or MBD and then polycrystallizes the amorphous silicon by solid phase growth, laser annealing, or the
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