Consequently, it is suitable if only the resist solution discharged from the resist nozzles 61 a to 61 c is supplied onto the surface of the substrate G, and an operation such as processing is not performed in the space from the resist nozzles 61 a to 61 c to the substrate G, therefore the mechanical accuracy of the resist nozzles 61 a to 61 c such as the shapes and the diameters of the nozzles, a