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An Entity of Type : prov:Entity, within Data Space : webisa.webdatacommons.org associated with source dataset(s)

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  • A sputter etching apparatus including a vacuum chamber provided with a gas supply system and an evacuator, a sputter etching electrode disposed within the vacuum chamber on which a substrate is disposed, a plasma generator for generating plasma by applying microwave energy and disposed in opposition to the sputter etching electrode, a voltage applying stud provided in association with the sputter
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