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  • t method for single damascene trench applicationsUS7195700Jan 30, 2004Mar 27, 2007Novellus Systems, Inc.Method of electroplating copper layers with flat topographyUS7247223Apr 28, 2003Jul 24, 2007Semitool, Inc.Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesUS7473339Apr 16, 2004Jan 6, 2009Applied Materials, Inc
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