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  • tor device using the sameUS7459392 *31 Mar 20052 Dic 2008Intel CorporationNoble metal barrier and seed layer for semiconductorsUS7491430 *14 Jul 200517 Feb 2009Tokyo Electron LimitedDeposition method for forming a film including metal, nitrogen and carbonUS7501675 *18 Abr 200510 Mar 2009Kabushiki Kaisha ToshibaSemiconductor device and method of manufacturing the sameUS7524765 *2 Nov 200528 Abr 200
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