| prov:value
| - It is sufficient that a silicon oxide film formed in this invention is present at least a portion being in contact with silicon and, therefore, use may be made of an insulating film formed, on the silicon oxide film, with one or more layers of different kinds of materials, such as an oxide, a nitride, an oxynitride, a silicate, and the like of an alkaline earth metal, a rare earth metal, and a tra
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