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  • Therefore, the thickness of the second insulating layer 112 is set to be 1 to 10 nm, preferably 2 to 3 nm. [0066] An organic compound layer 113 is formed by stacking a combination of a plurality of layers such as a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, an electron injection layer, and a buffer layer in addition to a light-emitting layer.
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