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  • native and/or additional positioning mechanisms (such as steppers, x-y tables, gimbals, goniometers, and any other mechanisms) can be included anywhere within metrology system 200A. For example, stage 230A can include a rotational positioning mechanism 231A for changing the azimuthal angle ?? of probe beam 211A relative to measurement pattern 290A. In another embodiment, analyzing optics 240A can
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