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  • In a fourth photolithographic step B7, after forming the second metal film 84, the second metal film 64 is patterned, for example, by wet etching to form a source electrode 68, a source wiring 66 and a drain electrode 67 shown in FIG. 17, and the transparent conductive film 61 is patterned by a method such as dry etching to form a transparent pixel electrode 69 and, further, a portion of the secon
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